
Aluminum oxide powder
Name:Aluminum oxide powder
Model:CM0200002
Unit:KG
Specification(Grade):99.99%
Price:USD 0.000
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Goods detail informatio
Aluminum oxide: also known as bauxite, corundum. Aluminum content in the crust of the Earth is ranked at third; in the nature it often exists in the form of oxides; its common purity is 99.5% and 96%.
} Used in various kinds of blasting and grinding operations.
} Materialization and aesthetic feeling processing of poly or acrylic arts.
} Blasting in the TV screen manufacturing process.
} Additives to refractory materials or other ceramics.
} Growing sapphire crystal, polishing…etc.
White Aluminum oxide
Chemical formula: Al2O3
Shape: polygonal
Mohs hardness: 9
Density: 3.95-3.97
※All the specifications listed above are common specifications, the actual specifications, particle size and purity all can be adjusted according to customer needs.
Application description of high-purity aluminum oxide products
1. High temperature resistance, good thermal conductivity, high hardness, good infrared penetration chemical stability.
2. Widely used in industrial, defense and scientific research fields (for example: high-temperature infrared window ... etc.)
3. Widely used monocrystalline basic material, currently is the preferred substrate (first need to outreach GaN thin film on sapphire substrate) of blue, purple, white light-emitting diode (LED) and blue laser (LD) industries, is also an important superconducting thin film substrate.
4. Sapphire is a very important basic material for superconducting thin film. It can be used to produce Y-, La-high temperature superconducting thin films...etc., and also can be used to grow new type practicalMgB2 (magnesium diboride)superconducting thin film.
High purity aluminum oxide specifications:
→Aluminum oxide powder
→Aluminum oxide ingot
| Aluminum oxide powder applications: |
} Used in various kinds of blasting and grinding operations.
} Materialization and aesthetic feeling processing of poly or acrylic arts.
} Blasting in the TV screen manufacturing process.
} Additives to refractory materials or other ceramics.
} Growing sapphire crystal, polishing…etc.
| Aluminum oxide powder specification: |
White Aluminum oxide
Chemical formula: Al2O3
Shape: polygonal
Mohs hardness: 9
Density: 3.95-3.97
General grinding composition (%):
| Al2O3 | Na2O | SiO2 | Fe2O3 | CaO+MgO |
| 99.6% | 0.18% | 0.01% | 0.02% | 0.02% |
| Particle size(μm) | 3.0±2 | 4±2 | 6±2 | 12±2 | 30±2 | 35±2 |
| 45±2 | 60±2 | 75±2 | 90±2 | 105±2 | 125±2 | |
| 150±2 | 180±2 | 250±2 | 300±2 | 350±2 | 500±2 | |
| 600±2 | 710±2 | 1180±2 | 1700±2 | 2000±2 |
High purity aluminum oxide composition(ppm):
| Al2O3(%) | Fe | Ca | Si | Cu | Pb | Mg | Ni |
| 99.99 | <4 | <9 | <10 | <3.5 | <5 | <10 | <3 |
High purity aluminum oxide composition(ppm):
| Al2O3(%) | Si | Fe | Cu | Na |
| 99.999 | <2 | <0.5 | <1 | <0.5 |
| Ca | Mg | Zn | Ti | |
| <0.1 | <0.5 | <1 | <0.5 |
※All the specifications listed above are common specifications, the actual specifications, particle size and purity all can be adjusted according to customer needs.
Application description of high-purity aluminum oxide products
1. High temperature resistance, good thermal conductivity, high hardness, good infrared penetration chemical stability.
2. Widely used in industrial, defense and scientific research fields (for example: high-temperature infrared window ... etc.)
3. Widely used monocrystalline basic material, currently is the preferred substrate (first need to outreach GaN thin film on sapphire substrate) of blue, purple, white light-emitting diode (LED) and blue laser (LD) industries, is also an important superconducting thin film substrate.
4. Sapphire is a very important basic material for superconducting thin film. It can be used to produce Y-, La-high temperature superconducting thin films...etc., and also can be used to grow new type practicalMgB2 (magnesium diboride)superconducting thin film.
High purity aluminum oxide specifications:
→Aluminum oxide powder
→Aluminum oxide ingot
| Purity | 5N | |
| Density(g/㎝3) | 3.6 | |
| Impurities content | Si<(ppm) | 2.5 |
| Fe<(ppm) | 1.0 | |
| Cu<(ppm) | 1.0 | |
| Na<(ppm) | 1.0 | |
| Ca<(ppm) | 1.0 | |
| Mg<(ppm) | 1.0 | |
| Ti<(ppm) | 0.5 | |
| Pb<(ppm) | 1.0 | |

